Quality alternative consumable parts for PVD equipment
Delivery term:The date of payment from buyers deliver within days- Price:
Negotiable
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- Total supply:
- Delivery term:
The date of payment from buyers deliver within days
- seat:
Beijing
- Validity to:
Long-term effective
- Last update:
2024-03-28 22:07
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Company Profile
- Baoji Magotan Nonferrous Metals Co., Ltd
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Contact:
zamaqa(Mr.)
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Email:
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Telephone:
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Phone:
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Area:
Beijing
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Address:
BaoTi Rd, Weibin District, Baoji, Shaanxi, China721013
- Website: http://sjqxiilm.qishifu1688.com/
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Product details
E-beam evaporation crucible liner
The electron beam evaporation method is a kind of vacuum evaporation coating. It is a method of directly heating the evaporation material with an electron beam under vacuum conditions, making the evaporation material vaporize and transporting it to the substrate, and condensing on the substrate to form a thin film. In the electron beam heating device, the heated material is placed in a water-cooled E-beam evaporation crucible liner, which can avoid the reaction between the evaporation material and the crucible wall and affect the quality of the film. Therefore, the electron beam evaporation deposition method can prepare high-purity films, and at the same time, the same evaporation deposition Multiple crucibles can be placed in the device to achieve simultaneous or separate evaporation and deposition of a variety of different substances. With electron beam evaporation, any material can be evaporated.
advantage of E-beam evaporation crucible liner
Electron beam evaporation can evaporate high melting point materials with E-beam evaporation crucible liner. Compared with general resistance heating evaporation, it has higher thermal efficiency, higher beam density, and faster evaporation speed. The resulting film has high purity and good quality, and its thickness can be controlled more accurately. It can be widely used in the preparation of high-purity films. Films of various optical materials such as thin films and conductive glass.
Electron beam evaporation is characterized by no or very little coverage on both sides of the target three-dimensional structure, usually only deposited on the target surface. This is the difference between sputtering and electron beam evaporation.
Application of E-beam evaporation crucible liner
Commonly used in the field of semiconductor research and industry. The accelerated electron energy is used to hit the material target so that the material target evaporates and rises. Finally deposited on the target.
link:http://www.mtionsource.com
The electron beam evaporation method is a kind of vacuum evaporation coating. It is a method of directly heating the evaporation material with an electron beam under vacuum conditions, making the evaporation material vaporize and transporting it to the substrate, and condensing on the substrate to form a thin film. In the electron beam heating device, the heated material is placed in a water-cooled E-beam evaporation crucible liner, which can avoid the reaction between the evaporation material and the crucible wall and affect the quality of the film. Therefore, the electron beam evaporation deposition method can prepare high-purity films, and at the same time, the same evaporation deposition Multiple crucibles can be placed in the device to achieve simultaneous or separate evaporation and deposition of a variety of different substances. With electron beam evaporation, any material can be evaporated.
advantage of E-beam evaporation crucible liner
Electron beam evaporation can evaporate high melting point materials with E-beam evaporation crucible liner. Compared with general resistance heating evaporation, it has higher thermal efficiency, higher beam density, and faster evaporation speed. The resulting film has high purity and good quality, and its thickness can be controlled more accurately. It can be widely used in the preparation of high-purity films. Films of various optical materials such as thin films and conductive glass.
Electron beam evaporation is characterized by no or very little coverage on both sides of the target three-dimensional structure, usually only deposited on the target surface. This is the difference between sputtering and electron beam evaporation.
Application of E-beam evaporation crucible liner
Commonly used in the field of semiconductor research and industry. The accelerated electron energy is used to hit the material target so that the material target evaporates and rises. Finally deposited on the target.
link:http://www.mtionsource.com
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